NEXT@Fashion InStyle 強勢回歸香港時裝節(Fashion InStyle)!本屆聚焦科技布料,引領業界探索新世代物料如何推動產業變革與可持續發展。
焦點之一,是本地新銳品牌
PONDER.ER 與杭州物料研發先鋒「布料图书馆 Textile Library」深度合作,採用特殊的「定位裂紋」工藝布料,展現動態視覺效果。此外,項目顧問兼 Self-Portrait 創辦人 Han Chong 亦率領六組設計單位,探索不同物料的無限潛能。
香港時裝節將於 4 月 27 至 30 日在會展舉行,時尚愛好者絕對不容錯過!
NEXT@Fashion InStyle is back in Hong Kong—stronger than ever! This year’s festival puts technology-driven fabrics in the spotlight, exploring how next-generation materials can reshape the industry while advancing sustainability.
A key highlight: local new brand
PONDER.ER teams up with Hangzhou’s material R&D pioneer “Textile Library,” using a special “crack-mapping” (定位裂紋) textile technique to create dynamic visual effects. Project consultant and Self-Portrait founder Han Chong also leads six design teams, pushing the possibilities of material innovation even further.
Fashion InStyle will run from April 27 to 30 at the Hong Kong Convention and Exhibition Centre. Fashion lovers—this one is not to be missed!
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